发明名称 GATE GROUND NMOS UNIT FOR ANTI-STATIC PROTECTION AND ANTI-STATIC PROTECTION STRUCTURE THEREOF
摘要 <p>Provided is a GGNMOS unit for anti-static protection, which has a regular polygon shape. The drain thereof is closed by a ring gate, the ring gate is surrounded by a source with a regular polygon shape concentric therewith, the outside of the source is provided with a concentric substrate ground area with a regular polygon shape with equal distance thereto, and both of them are separated uniformly by a field oxygen area. Correspondingly, also provided is an anti-static protection structure based on a GGNMOS unit. The present invention uses the method wherein the ring gate closes the drain and the source is surrounded by a concentric substrate ground area by changing the plane layout structure of the GGNMOS unit to make the series resistance of the base of the parasitic transistor equal everywhere. The anti-static protection structure in the present invention can start up each ESD protection device unit uniformly and simultaneously when static occurs, thus reaching high ESD protection ability higher than HBM 8 KV.</p>
申请公布号 WO2012152092(A1) 申请公布日期 2012.11.15
申请号 WO2012CN70728 申请日期 2012.01.29
申请人 ADVANCED SEMICONDUCTOR MANUFACTURING CO., LTD;LV, YUQIANG 发明人 LV, YUQIANG
分类号 H01L23/62;H01L29/06 主分类号 H01L23/62
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