METHOD OF SELECTING PROCESS LIQUID, METHOD OF MANUFACTURING MASK BLANK AND METHOD OF MANUFACTURING MASK

摘要

PROBLEM TO BE SOLVED: To provide a method of selecting a suitable process liquid that allows suppression of occurrence of a potential mask blank defect that results in a micro-black defect in a mask.

SOLUTION: A method of selecting a process liquid includes: a step 1 of preparing a plurality of mask blanks each having a thin film serving as a transfer pattern made of a material that can be subjected to dry etching; a step 2 of preparing a plurality of types of process liquids containing etching inhibitors of different concentrations; a step 3 of performing a surface treatment using the process liquids; a step 4 of subjecting the surface-treated mask blank to dry etching for removal, and then obtaining several pieces of surface form information of a substrate surface after etching; a step 5 of selecting surface form information satisfying a desired specification or quality from a corresponding relation between the concentrations of the etching inhibitors and the several pieces of surface form information of the substrate surface, to specify a corresponding concentration of the etching inhibitor; and a step 6 of selecting a process liquid having the specified concentration as a process liquid used for a surface treatment of the mask blank.

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