发明名称 |
PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION AND RESIN USED IN THE COMPOSITION |
摘要 |
<p>A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.</p> |
申请公布号 |
EP2324392(A4) |
申请公布日期 |
2012.11.14 |
申请号 |
EP20090811498 |
申请日期 |
2009.08.26 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TAKAHASHI, HIDENORI;TSUCHIMURA, TOMOTAKA;TSUCHIHASHI, TORU;YAMASHITA, KATSUHIRO;NISHIKAWA, NAOYUKI |
分类号 |
G03F7/039;C08F212/14;C08F220/10;C08F222/40;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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