| 摘要 |
PURPOSE: A plasma treatment systems and a method for uniformly distributing radio frequencies between a plurality of electrodes are provided to uniformly distribute radio frequency power to the plurality of electrodes with improved input impedance at a high operating frequency like 13.56MHz. CONSTITUTION: A supporter(35) comprises a plurality of product holders(38) and a bottom plate(39) which is arranged between the product holder and a lower sidewall of a vacuum chamber. Each product holder of the supporter has a rim surrounded by a horizontal upper bar(52), a vertical member of a rear road(54), and a pair of vertical members of front loads(56,58). The rear road connects one end of the upper bar to a bottom plate. The front loads connect an opposite end portion of the upper bar to the bottom plate. Top and lower cross members(60,62) of each product holder are mechanically connected to the loads. |
