发明名称 Electron beam generator
摘要 <p>The invention relates to an electron beam generator for generating an electron beam, comprising an electron source and an extractor. The combination of electron source and extractor in use forms a negative lens, wherein said extractor has a positive voltage with respect to the source. The extractor and the electron source are positioned such that, in use, a space charge limited region is present between them. In an embodiment, the extractor is a planar extractor. In another embodiment, the source is a thermionic source.. The generator may comprise an illumination system for collimating the electron beam.</p>
申请公布号 EP2523207(A2) 申请公布日期 2012.11.14
申请号 EP20120179910 申请日期 2003.10.30
申请人 MAPPER LITHOGRAPHY IP B.V. 发明人 WIELAND, MARCO JAN-JACO;KAMPHERBEEK, BERT JAN;VAN VEEN, ALEXANDER HENDRIK VINCENT;KRUIT, PIETER
分类号 H01J37/317;A61N5/00;B82Y10/00;B82Y40/00;G01Q30/02;G01Q30/08;G03B1/00;H01J3/02;H01J37/06;H01J37/08;H01J37/30;H01J37/304 主分类号 H01J37/317
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