发明名称 |
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM |
摘要 |
<p>Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.</p> |
申请公布号 |
EP2521941(A1) |
申请公布日期 |
2012.11.14 |
申请号 |
EP20110731870 |
申请日期 |
2011.01.07 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
ENOMOTO, YUICHIRO;TARUTANI, SHINJI;KAMIMURA, SOU;IWATO, KAORU;KATO, KEITA;SHIBUYA, AKINORI |
分类号 |
G03F7/004;C08F20/34;G03F7/038;G03F7/039;G03F7/32;G03F7/38;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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