Method of fabricating semiconductor device having low contact resistance,申请号KR20110013464-传众专利搜索

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发明名称	Method of fabricating semiconductor device having low contact resistance
摘要
申请公布号	KR101195269(B1)	申请公布日期	2012.11.14
申请号	KR20110013464	申请日期	2011.02.15
申请人		发明人
分类号	H01L21/8238;H01L21/336;H01L29/78	主分类号	H01L21/8238
代理机构		代理人
主权项
地址

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