| 摘要 |
PURPOSE: A manufacturing method of nano-particles of thiamine di-lauryl sulfate(tds) and a nano-particle solution thereof are provided to enhance anti-fungal efficacy for various crop diseases generating pathogens. CONSTITUTION: A manufacturing method of nano-particles of thiamine di-lauryl sulfate(tds) comprises dry grinding process, consecutive pulse laser processes, and high pressure homogenizing process. The dry grinding process includes the following step: pulverizing the thiamin derivative into the particle size of 1-10 micro meters. The consecutive pulse laser process includes the following step: irradiating pulse laser into 3 steps according to the energy strength by consecutively agitating the thiamin derivative powder with water. The wavelength of the pulse laser is 300-500 nano meters, the pulse length is 10ns, and the pulse repetition rate is 10Hz. The consecutive pulse laser process additionally includes the following step: making the size of the thiamin derivative as 400-700 nano meters by adding a dispersing agent as 0.1-0.5% of the total volume of the thiamin derivative particle solution. [Reference numerals] (AA) A process; (B1) Dry pulverizing pre-processing; (B2) Condition: controlling the air flow rate as 12.000Nm^3h^-1 and the rotary moisture content as 5% or less; (C1) Consecutive pulse laser process; (C2) Condition: agitating the particle solution consecutively while irradiating pulse type laser step by step; (C3) Wavelength of 300-500nm; (C4) Pulse width: 10ns(FWHM); (C5) Pulse repeating rate: 10Hz; (DD) Irradiating the pulse energy at 100mJ for 5-7 minutes; (EE) Irradiating the pulse energy at 200mJ for 5-7 minutes; (FF) Irradiating the pulse energy at 300mJ for 5-7 minutes; (GG,HH) Addition; (II) Adding 0.1-0.5% of total volume of dispersing agent monolaurate particle solution after irradiating the pulse energy at 100mJ for 5-7 minutes; (JJ) Adding 0.1-0.5% of total volume of dispersing agent monolaurate particle solution after irradiating the pulse energy at 200mJ for 5-7 minutes; (K1) High pressure homogenization process; (K2) Condition: circulating 3-5 times at the pressure of 15000-20000 psi; (L1) Particle size: average 200 nm or less; (L2) Useable nano-particle content:85%; (MM) B process; (N1) Conventional dry pulverizing mono process; (N2) Condition: controlling the compressive strength as 34~37 kg/cm^2 and the moisture content as 2-6%; (N3) Particle size: average tens ofμm; (N4) Useable nano-particle content:15%; (OO) C process; (P1) Conventional high pressure homonization mono-processing; (P2) Condition: 30000 psi pressure; (P3) Particle size: average 1μm; (P4) Useable nano particle content:5-10%
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