发明名称 |
Substrate etching apparatus |
摘要 |
A substrate etching apparatus includes a supporting unit for supporting substrate in a vertical position and an etching solution supply unit disposed above the substrate to supply an etching solution to the top of the substrate such that the etching solution runs down both of faces of the substrate from the top of the substrate. |
申请公布号 |
US8308894(B2) |
申请公布日期 |
2012.11.13 |
申请号 |
US20090458552 |
申请日期 |
2009.07.15 |
申请人 |
MUN DAE-SEUNG;KIM JOO-HEON;SAMSUNG DISPLAY CO., LTD. |
发明人 |
MUN DAE-SEUNG;KIM JOO-HEON |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|