| 摘要 |
<p>An application apparatus (1) which comprises a cleaning mechanism (3) having a piping (12 to 14) in which an application fluid flows, a die head (9) provided in the piping (12 to 14) and a plurality of solvent tanks (22a to 22d) for storing solvents of types different from one another. The cleaning mechanism (3) supplies solvents stored in the above solvent tanks (22a to 22d) to the above piping (12 to 14), in such a manner that a solvent compatible with the above application fluid is first supplied and then it is gradually changed to a solvent having a higher detergency, to thereby clean the inside of the piping (12 to 14) and the inside (9a, 9b) of the die head (9).</p> |
