| 发明名称 |
Inspection method for semiconductor wafer and apparatus for reviewing defects |
| 摘要 |
An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
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| 申请公布号 |
US8309919(B2) |
申请公布日期 |
2012.11.13 |
| 申请号 |
US20090352357 |
申请日期 |
2009.01.12 |
| 申请人 |
OBARA KENJI;HIRAI TAKEHIRO;HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
OBARA KENJI;HIRAI TAKEHIRO |
| 分类号 |
G01N23/00;A61N5/00;G21K7/00 |
主分类号 |
G01N23/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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