| 摘要 |
One embodiment of the present invention is a thin film transistor, including: an insulating substrate; a gate electrode and a gate insulator being formed on the insulating substrate, in this order; a source electrode and a drain electrode formed on the gate insulator, surface preparation of the source electrode and the drain electrode being performed with a compound having a functional group with an electron-withdrawing property; and a semiconductor film formed on the gate insulator, the film being formed between the source electrode and the drain electrode. |
