发明名称 METHOD FOR PRODUCING COLOR FILTER, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN, AND SMALL PHOTOMASK
摘要 A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.
申请公布号 KR101201138(B1) 申请公布日期 2012.11.13
申请号 KR20107026422 申请日期 2009.04.30
申请人 发明人
分类号 G02B5/20;G03F1/50;G03F7/20 主分类号 G02B5/20
代理机构 代理人
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