| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a resin for resist compositions having excellent line width roughness. <P>SOLUTION: The method for producing the resin having structural units represented by formulas (I) and (II) includes the first step of polymerizing a monomer represented by formula (III) and a monomer represented by formula (IV), and the second step of hydrolyzing the product obtained in the first step to convert -O-CO-R<SP POS="POST">7</SP>into -OH. [wherein, R<SP POS="POST">1</SP>and R<SP POS="POST">5</SP>are each alkyl which may have a halogen atom, hydrogen atom or halogen atom; R<SP POS="POST">2</SP>-R<SP POS="POST">4</SP>are each alkyl or an alicyclic hydrocarbon group; R<SP POS="POST">2</SP>and R<SP POS="POST">3</SP>are bound to each other to form a divalent hydrocarbon group; X<SP POS="POST">1</SP>and X<SP POS="POST">2</SP>are each a single bond or a divalent linking group]. <P>COPYRIGHT: (C)2013,JPO&INPIT |
