发明名称 SUPPORT STRUCTURE OF TRAY, PLASMA CVD APPARATUS, AND VACUUM TREATMENT APPARATUS FOR SOLAR CELL PRODUCTION
摘要 <P>PROBLEM TO BE SOLVED: To improve flatness of a tray supported by a lifting and lowering device when performing treatment on a substrate placed on the tray for mounting a workpiece. <P>SOLUTION: A plurality of trays T on a substrate cart K are supported by conveying rollers R on a substrate conveying device 70 at the lower surfaces of a pair of side edges. A plurality of lifting and lowering devices 50 are arranged beneath the substrate cart K, and the lower surface of the tray T is supported by a holding part 52 on the tip side of each lifting and lowering device 50 via a support plate 53. A thin film is formed on the substrate W mounted on the tray T while the supporting surface of the lower surface of the tray T supported by the holding part 52 of each lifting and lowering devices 50 and the supporting surface of the lower surface of the tray T supported by the plurality of conveying rollers R are set to such a position that the lower surface of the tray T has the same height. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012219280(A) 申请公布日期 2012.11.12
申请号 JP20110082811 申请日期 2011.04.04
申请人 SHIMADZU CORP 发明人 TAGUCHI TATSUHIRO;AZUMA MASAHISA;OKA DAISUKE;MORIMOTO YOSUKE
分类号 C23C16/44;H01L21/31 主分类号 C23C16/44
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