| 摘要 |
PURPOSE: A retainer ring for a chemical mechanical polishing apparatus and a manufacturing method thereof are provided to reduce manufacturing costs by omitting a process that eliminating a protrusion part of a manufacture pin which is combined with a ring. CONSTITUTION: A plurality of bolt holes(12) for combining with a head of a chemical mechanical polishing apparatus is formed on the upper side of an internal ring(14). A female thread is formed in the inner site of the plurality of bolt holes. The internal ring comprises one or more slot holes in order to connect the plurality of bolt holes. A bolted connection body is formed by filling the slot hole with material except for the plurality of bolt holes of the internal ring. An external ring(18) surrounds the internal ring with the resin material.
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