| 摘要 |
A system and method of laser etching materials is provided. A series of optical elements are used to reduce the spot size of a laser for a given field size, allowing fine detailed graphics associated with small spot sizes to be etched with larger field sizes. This may be accomplished, for example, by increasing the size of a laser beam beyond its natural state before passing the beam through a focusing lens (34), such expander lens (24), focus lens and mirror system (16) increased in size so as to generate a laser spot size less than or equal to 0.5 mm at a field size equal to or larger than 1500 mm square. |
