| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming the phase separation structure of a block copolymer into the shape of a lamellar structure which is oriented in a direction vertical to a substrate surface by adjusting a thin film pattern comprising a surface treatment agent. <P>SOLUTION: A method of manufacturing the substrate includes steps of: forming an neutralization film containing the surface preparation agent on the substrate; forming a mask pattern comprising resist on the neutralization film; transferring the mask pattern on the neutralization film, removing the mask pattern from the neutralization film, forming a layer containing a block copolymer obtained by bonding a plurality of kinds of polymers with one another to cover the neutralization film and then, heating the layer containing the block copolymer to perform phase separation. The surface preparation agent has an affinity with every polymers constituting the block copolymer. The mask pattern is an L/S pattern in which the width of the line and the interval of the space is 0.5 times or 1-10 integral multiple of period of the block copolymer. The substrate has the phase separation structure on the surface thereof. <P>COPYRIGHT: (C)2013,JPO&INPIT |
