发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method in which a semiconductor chip is exposed to a high temperature the least number of times. <P>SOLUTION: A semiconductor device manufacturing method comprises the steps of: preparing a plurality of semiconductor chips 10 each having bump electrodes 12 connected via a through electrode 13; laminating a second semiconductor chip 10b on a first semiconductor chip 10a such that the bump electrodes 12 confront each other; temporarily pressure bonding the bump electrodes 12 on the semiconductor chip 10a with the bump electrodes on the semiconductor chip 10b; laminating a third semiconductor chip 10c on the semiconductor chip 10b such that the bump electrodes 12 confront each other; temporarily pressure bonding the bump electrodes 12 on the semiconductor chip 10b with the bump electrodes 12 on the semiconductor chip 10c to form a chip laminate 11; and actually pressure bonding the plurality of bump electrodes 12 collectively that are temporarily pressure bonded in the chip laminate 11. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012222038(A) 申请公布日期 2012.11.12
申请号 JP20110083705 申请日期 2011.04.05
申请人 ELPIDA MEMORY INC 发明人 FUJISHIMA HIROYUKI;YOSHIDA MASANORI
分类号 H01L25/065;H01L25/07;H01L25/18 主分类号 H01L25/065
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