发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method in which a semiconductor chip is exposed to a high temperature the least number of times. <P>SOLUTION: A semiconductor device manufacturing method comprises the steps of: preparing a plurality of semiconductor chips 10 each having bump electrodes 12 connected via a through electrode 13; laminating a second semiconductor chip 10b on a first semiconductor chip 10a such that the bump electrodes 12 confront each other; temporarily pressure bonding the bump electrodes 12 on the semiconductor chip 10a with the bump electrodes on the semiconductor chip 10b; laminating a third semiconductor chip 10c on the semiconductor chip 10b such that the bump electrodes 12 confront each other; temporarily pressure bonding the bump electrodes 12 on the semiconductor chip 10b with the bump electrodes 12 on the semiconductor chip 10c to form a chip laminate 11; and actually pressure bonding the plurality of bump electrodes 12 collectively that are temporarily pressure bonded in the chip laminate 11. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012222038(A) |
申请公布日期 |
2012.11.12 |
申请号 |
JP20110083705 |
申请日期 |
2011.04.05 |
申请人 |
ELPIDA MEMORY INC |
发明人 |
FUJISHIMA HIROYUKI;YOSHIDA MASANORI |
分类号 |
H01L25/065;H01L25/07;H01L25/18 |
主分类号 |
H01L25/065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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