发明名称 GAS TREATMENT APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas treatment apparatus which is easy to maintain and capable of reducing running cost and maintenance cost of the apparatus. <P>SOLUTION: The gas treatment apparatus includes: a plasma reaction part for generating a non-equilibrium plasma by electric discharge to treat gas containing harmful substances; a recovery part for contacting the gas treated through the plasma reaction part with a first treatment water to recover the water-soluble harmful substances in the treated gas into the first treatment water; a treatment part for supplying a predetermined vapor under elevated pressure to the first treatment water in which the water-soluble harmful substances are recovered to obtain a second treatment water containing fine bubbles; a separation part for decomposing the water-soluble harmful substances accompanying the extinction of the fine bubbles in the second treatment water by storing the second treatment water containing the fine bubbles and exposing the second treatment water to the atmospheric pressure to separate the second treatment water containing suspended solids into the first treatment water and the suspended solids; and a supply part for supplying the first treatment water separated in the separation part to the recovery part. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012217974(A) 申请公布日期 2012.11.12
申请号 JP20110089620 申请日期 2011.04.13
申请人 ORIENTAL KIDEN KK 发明人 OISHI TSUYOSHI
分类号 B01J19/08;B01D53/14;C02F1/24;C02F1/34;C02F1/52 主分类号 B01J19/08
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