| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film-forming device and film-forming method, improving use efficiency of a material and capable of stably forming a film with a uniform thickness. <P>SOLUTION: This film-forming device in which a film-forming raw material is flown to form a film on a substrate includes: a first film-forming unit in which the film-forming raw material is flown in the substantially perpendicular direction with respect to the substrate; a second film-forming unit in which the film-forming raw material having been flown in the substantially perpendicular direction in the first film-forming unit is flown in the direction substantially parallel with respect to the substrate to form a film; a moving unit which moves the substrate; and a heating unit which heats the substrate. <P>COPYRIGHT: (C)2013,JPO&INPIT |
