| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multi-column type electron beam exposure device and an exposure mask, capable of suppressing variation in a finish dimension of a pattern among column cells even if the line width of an opening pattern of an exposure mask of each column cell varies. <P>SOLUTION: The electron beam exposure device includes a plurality of column cells which are arranged above a sample and radiate electron beams for parallel exposure of a sample. An exposure mask 110 is used in which a plurality of patterns 163 having similar shapes and different line widths are arrayed in descending order at the portions corresponding to the column sells. A pattern 163 of a line width which is different from a pattern specified by exposure data by an amount of line width Δw corresponding to a deviation between a design value of line width of a pattern and a finish dimension of the pattern acquired by measurement in advance, is selected from the exposure mask 110. <P>COPYRIGHT: (C)2013,JPO&INPIT |
