| 发明名称 |
ETCHANT COMPOSITION FOR TRANSPARENT CONDUCTIVE FILM |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an etchant composition for a transparent conductive film capable of etching a crystalline ITO film without damage to copper and/or a copper alloy used for an electrode material or the like. <P>SOLUTION: An etchant composition for a crystalline transparent conductive film is made of an aqueous solution containing a fluorine compound of 1 to 10 wt.%. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2012222180(A) |
申请公布日期 |
2012.11.12 |
| 申请号 |
JP20110087012 |
申请日期 |
2011.04.11 |
| 申请人 |
KANTO CHEM CO INC |
发明人 |
YAMAGUCHI TAKAO;ISHIKAWA NORIO |
| 分类号 |
H01L21/308;H01L21/28;H01L21/306 |
主分类号 |
H01L21/308 |
| 代理机构 |
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