| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern, by which a resist pattern in a good shape with high sensitivity can be formed. <P>SOLUTION: There is provided a resist composition including: a polymer compound (A1) having a constitutional unit composed of a (meth)acrylate whose polarity is increased by an action of an acid, a (meth)acrylate unit including a -SO<SB POS="POST">2</SB>- containing cyclic group, and a (meth)acrylate unit represented by general formula (a5-1); and a component (B) that generates an acid by exposure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
