| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exhaust gas treatment device and an exhaust gas treatment method for performing degradative treatment at the same time on an exhaust gas containing silane compounds and an exhaust gas containing PFCs discharged during a process for manufacturing a semiconductor, a liquid crystal, or the like, the device being compact, capable of easily removing silica and capable of performing energy saving treatment. <P>SOLUTION: A double cylindrical degradation section 2 which is divided into an external cylinder side, to be a preliminary degradation section 21, and an internal cylinder side, to be a main degradation section 22 by a cylindrical electric heater 3 is formed; an exhaust gas containing silane compounds and an exhaust gas containing PFCs are introduced at the same time into one end side of the preliminary degradation section 21; on the other sides of the preliminary degradation section 21 and main degradation section 22, the preliminary degraded gas from the preliminary degradation section 21 which is preliminarily degraded is inverted and introduced into the main degradation section, while an additive gas is introduced to be mixed with the preliminary degraded gas; and a treated gas treated in the preliminary degradation section 21 and the main degradation section 22 is emitted from one end side of the main degradation section so as to attain a compact device which can easily remove silica and which can perform energy saving treatment. <P>COPYRIGHT: (C)2013,JPO&INPIT |
