发明名称 DEPOSITION APPARATUS AND DEPOSITION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a deposition apparatus and a deposition method, capable of forming a co-deposited film having a uniform film thickness and a uniform dope concentration on an inner peripheral surface of a cylindrical body. <P>SOLUTION: A deposition apparatus 30 for forming a co-deposited film on an inner peripheral surface of a cylindrical body 1, comprises: a cylindrical body holder 2 for holding the cylindrical body 1; a first deposition container 12 having an inner space for filling a first deposition material 11; and a second deposition container 22 having an inner space for filling a second deposition material 12. The cylindrical body holder 2 and the first and second deposition containers 12 and 22 are movable relatively to each other in a direction in which the cylindrical body 1 extends, and rotatable relatively to each other around a virtual axis line A-A extending in the direction in which the cylindrical body 1 extends. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012221579(A) 申请公布日期 2012.11.12
申请号 JP20110082815 申请日期 2011.04.04
申请人 FUJITEC INTERNATIONAL INC;MICRO SYSTEM:KK 发明人 KOJIMA MASAYUKI
分类号 H05B33/10;C23C14/24;C23C14/50;H01L51/50 主分类号 H05B33/10
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