发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a structure in which semiconductor wafers are bonded with each other. <P>SOLUTION: A semiconductor wafer manufacturing method of forming vias penetrating a plurality of semiconductor wafers comprises: detecting each chip before laminating the wafers to preliminarily remove a part of a via land by using means such as a medicine solution in the case where a defective chip is found, so as not to electrically connecting the via land and the through via; subsequently, laminating the semiconductor wafers; and forming the through vias from a surface on the side opposite to a bonded surface. As a result of removal of a part of the via land, a configuration such that the through vias and the defective chip are not be electrically connected can be achieved. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012221998(A) 申请公布日期 2012.11.12
申请号 JP20110082951 申请日期 2011.04.04
申请人 TOSHIBA CORP 发明人 ENDO MITSUYOSHI
分类号 H01L25/065;H01L21/822;H01L25/07;H01L25/18;H01L27/04 主分类号 H01L25/065
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