| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection apparatus in which sensitivity of defect detection can be improved by canceling trouble caused by optical distortion formed on a mask substrate. <P>SOLUTION: An inspection apparatus comprises first illumination optical systems (4 to 7) for projecting illumination light emitted from a light source 1 toward a photomask 8 for transmission inspection, a stage 9 which supports the photomask and is movable in a first direction and a second direction orthogonal with the first direction, photodetection means (17, 18) for receiving transmission light transmitted through the photomask via an objective lens 11 and polarized light separating means 13, and a signal processing device 19 which receives a luminance signal outputted from the photodetection means and detects a defect existent in the photomask. The signal processing device includes a memory storing therein luminance distribution data of transmission light on the mask substrate prior to forming a mask pattern, and correction means which corrects the luminance signal outputted from the photodetection means or the intensity of illumination light emitted from the light source on the basis of the luminance distribution data. <P>COPYRIGHT: (C)2013,JPO&INPIT |
