| 摘要 |
PURPOSE: A chemical-mechanical abrasive composition and a phase change alloy polishing method are provided to secure high selectivity by controlling selectivity of a TEOS(tetraethyl orthosilicate) removal speed for a Ge-St-Te alloy phase change alloy. CONSTITUTION: A chemical-mechanical abrasive composition comprises water, 0.1 to 5wt% of an abrasive, 0.001 to 5wt% of a phthalate, a phthalic anhydride, a phthalate compound, or a phthalic derivate, 0.001 to 5wt% of chelating agent, 0.001 to 0.1wt% of poly(acrylic acid-co-maleic acid), and 0.001 to 3wt% of oxidizing agent. The pH of the chemical-mechanical abrasive composition is 7.1 to 12. At least parts of Ge-St-Te alloy phase change alloy are removed from a substrate. |
