发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND SEMICONDUCTOR DEVICE |
摘要 |
There is provided a method for manufacturing a semiconductor device, comprising simultaneously or alternately exposing a substrate, which has two or more kinds of thin films having different elemental components laminated or exposed; and performing different modification treatments to the thin films respectively.
|
申请公布号 |
US2012280369(A1) |
申请公布日期 |
2012.11.08 |
申请号 |
US201013498020 |
申请日期 |
2010.12.15 |
申请人 |
SAITO TATSUYUKI;YUASA KAZUHIRO;HIROSE YOSHIRO;TAKEBAYASHI YUJI;SASAJIMA RYOTA;YAMAMOTO KATSUHIKO;YAMAZAKI HIROHISA;KOGURA SHINTARO;HAMAMURA HIROTAKA;HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
SAITO TATSUYUKI;YUASA KAZUHIRO;HIROSE YOSHIRO;TAKEBAYASHI YUJI;SASAJIMA RYOTA;YAMAMOTO KATSUHIKO;YAMAZAKI HIROHISA;KOGURA SHINTARO;HAMAMURA HIROTAKA |
分类号 |
C23C16/52;H01L21/02;H01L29/02 |
主分类号 |
C23C16/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|