| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition with which a resist pattern with excellent cross-sectional shape can be manufactured. <P>SOLUTION: The resist composition comprises (A) a resin, (B) an acid generator comprising a sulfonium salt or an iodonium salt, (X) a salt expressed by a formula (I), and (D) a solvent. A method for manufacturing a resist pattern using the above resist composition is also provided. In the formula, W represents an aromatic heterocycle including one quaternary nitrogen atom as an atom constituting the cycle, when n is 1, R<SP POS="POST">1</SP>represents a monovalent group bonded to the quaternary nitrogen atom, when n is 2, R<SP POS="POST">1</SP>represents an alkane diyl group or the like optionally having a substituent, and A<SP POS="POST">n1-</SP>represents a halogen ion or an organic anion. <P>COPYRIGHT: (C)2013,JPO&INPIT |
