| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology regarding a gas barrier film capable of obtaining a favorable balance among transmittance of visible light, coatability, and flexibility. <P>SOLUTION: This gas barrier film 1 comprises a buffer layer 2 containing a silicon compound, and a barrier layer 3 laminated on the buffer layer 2 and containing silicon oxide and/or silicon nitride, wherein, with respect to the Fourier transform infrared absorption spectrum of the buffer layer 2, A<SB POS="POST">R</SB>and t satisfy A<SB POS="POST">R</SB><3 and the formula (1), or A<SB POS="POST">R</SB>≥3 and the formula (2), wherein A<SB POS="POST">R</SB>(A<SB POS="POST">R</SB>=A1/A2) is a ratio between the infrared absorbance A1 at the wave number of 900 cm<SP POS="POST">-1</SP>and the infrared absorbance A2 at the wave number of 1,260 cm<SP POS="POST">-1</SP>, t (nm) is the total thickness of the buffer layers contained in the gas barrier film, formula (1) is t≤15656/A<SB POS="POST">R</SB><SP POS="POST">3.313</SP>, and formula (2) is t≤837/A<SB POS="POST">R</SB><SP POS="POST">0.648</SP>. <P>COPYRIGHT: (C)2013,JPO&INPIT |
