| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a spectral purity filter suitable for enhancing the spectral purity of EUV light or laser light in an EUV light generating device which generates EUV light for use in exposure of a semiconductor wafer, or a laser device system such as a laser beam machine. <P>SOLUTION: The spectral purity filter includes multiple segments each of which has a mesh having electric conductivity in which an array of openings having an opening size equal to or smaller than a predetermined size is formed, and a frame which supports at least the peripheral part of the multiple segments. <P>COPYRIGHT: (C)2013,JPO&INPIT |
