| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a TiO<SB POS="POST">2</SB>-containing quartz glass substrate which, when used as a molding substrate for nanoimprint lithography, can form a concavoconvex pattern having dimensional fluctuations within ±10%. <P>SOLUTION: The TiO<SB POS="POST">2</SB>-containing quartz glass substrate is characterized in that the coefficient of thermal expansion at 15-35°C is within ±200 ppb/°C, the TiO<SB POS="POST">2</SB>concentration is 4-9 wt.%, and the TiO<SB POS="POST">2</SB>concentration distribution in the region near the surface to 50 μm in depth from the substrate surface on the side where a transfer pattern is to be formed is within ±1 wt.%. <P>COPYRIGHT: (C)2013,JPO&INPIT |
