发明名称 Self-Aligned Contacts for Field Effect Transistor Devices
摘要 A field effect transistor device includes a gate stack disposed on a substrate a first contact portion disposed on a first distal end of the gate stack, a second contact portion disposed on a second distal end of the gate stack, the first contact portion disposed a distance (d) from the second contact portion, and a third contact portion having a width (w) disposed in a source region of the device, the distance (d) is greater than the width (w).
申请公布号 US2012280322(A1) 申请公布日期 2012.11.08
申请号 US201213554305 申请日期 2012.07.20
申请人 GUO DECHAO;HAENSCH WILFRIED E.;WANG XINHUI;WONG KEITH KWONG HON;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GUO DECHAO;HAENSCH WILFRIED E.;WANG XINHUI;WONG KEITH KWONG HON
分类号 H01L29/78 主分类号 H01L29/78
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