| 摘要 |
<P>PROBLEM TO BE SOLVED: To use data about a transmitted light quantity distribution of an inspection device to detect an internal defect, etc. of a transfer mask. <P>SOLUTION: A manufacturing method for a transfer mask includes: a step for, through application of a Die-to-Die comparison inspection procedure, acquiring a first transmitted light quantity distribution by exposing a first area of a thin film to an inspection light, and acquiring a second transmitted light quantity distribution by also exposing a second area to the inspection light; a step for generating a predetermined range difference distribution where a coordinate, which shows that a difference light quantity value calculated from a comparison between the first and second transmitted light quantity distributions is equal to or greater than a first threshold and is less than a second threshold, is plotted; and a step for selecting a transfer mask for which an area with highly-dense plots is not detected in the predetermined range difference distribution. <P>COPYRIGHT: (C)2013,JPO&INPIT |
