| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a metalized film having excellent characteristics by controlling the ratio of respective metal components in a metal vapor deposition electrode on a dielectric film. <P>SOLUTION: The vacuum evaporator includes: a vapor deposition chamber 8 in which an upper part is opened; a plurality of evaporation sources 16 that are disposed in the vapor deposition chamber and heat a metal material to generate metal vapor; a partition 18 that divides the plurality of evaporation sources one another in the vapor deposition chamber. The partition includes: a plate-like base 24 so as to horizontally movable; and a partition plate 25 disposed in the upper part of the base so as to vertically movable. This configuration allows an area of opening for discharging the respective metal vapor to be freely changed, and further, an amount that the metal vapor from each of evaporation sources overlaps one another to be controlled. As a result, an amount of vapor deposition of the metal vapor and a state thereof can be controlled and the ratio and a distribution state of the respective metal components in the metal vapor deposition electrode can be controlled. In addition, the metalized film having excellent characteristics can be manufactured. <P>COPYRIGHT: (C)2013,JPO&INPIT |
