| 摘要 |
A half tone mask is characterized in that the half tone mask having at least one or more half permeation parts capable of adjusting a transmittance by adjusting pattern density of a fine pattern forming the half permeation part, whereby a pattern density of a fine pattern can be adjusted to enhance the efficiency of adjusting the transmittance in a half tone mask formed with a slit type half permeation part, a stacked type half permeation part or a combination thereof, and the transmittance of the half permeation region can be accurately controlled through adjustment of the pattern density without recourse to a separate manufacturing process. |
