发明名称 PRE- CUT WAFER APPLIED UNDERFILL FILM
摘要 <p>A method for preparing a semiconductor with preapplied underfill comprises providing a semiconductor wafer with a plurality of metallic bumps on its top side and, optionally, through- silica- vias vertically through the silicon wafer; laminating a back grinding tape to the top of the wafer covering the metallic bumps and through silicon vias; thinning the back side of the wafer; mounting a dicing tape to the back side of the thinned wafer and mounting the silicon wafer and dicing tape to a dicing frame; removing the back grinding tape; providing an underfill material precut into the shape of the wafer; aligning the underfill on with the wafer and laminating the underfill to the wafer.</p>
申请公布号 WO2012106191(A3) 申请公布日期 2012.11.08
申请号 WO2012US22853 申请日期 2012.01.27
申请人 HENKEL CORPORATION;KIM, YOUNSANG;HOANG, GINA;GUINO, ROSE 发明人 KIM, YOUNSANG;HOANG, GINA;GUINO, ROSE
分类号 H01L21/50 主分类号 H01L21/50
代理机构 代理人
主权项
地址