发明名称 CONTROL DEVICE OF SUBSTRATE PROCESSING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To control transportation of a wafer according to a degree of microfabrication required for each lot. <P>SOLUTION: A substrate processing device comprises plural PMs 400 for applying predetermined processing to a wafer W, and an LLM 500, in which a transportation mechanism for transporting the wafer W is built. An EC 200 controls the substrate processing device. The A selection part 255 of the EC 200 selects the PM 400, to which the wafer is transported next, and also selects for each lot a unit of the wafer W transported to the same PM from one lot or one wafer according to a degree of microfabrication required for each lot. A transportation control part 260 of the EC 200 sequentially transports the wafers W included in a lot to the selected same PM 400 when transportation of a lot unit is selected, and sequentially OR-transports the wafers W included in the lot one by one from the selected PM 400 to the other PM 400 when transportation of a wafer unit is selected. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012216852(A) 申请公布日期 2012.11.08
申请号 JP20120129085 申请日期 2012.06.06
申请人 TOKYO ELECTRON LTD 发明人 NUMAKURA MASAHIRO
分类号 H01L21/677;H01L21/02 主分类号 H01L21/677
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