发明名称 PATTERN FORMATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern formation method which does not need any special mask plate in a light exposure step. <P>SOLUTION: The surface side 11a of a quartz glass substrate 11 on which a chromium/nickel laminate 27 containing a nickel film 26 formed in a wiring pattern is coated with a negative photoresist 31. Thereafter, exposure light 32 is made to strike the glass substrate 11 from its back side 11b to expose the negative photoresist 31 by using the chromium/nickel laminate 27 as a mask plate. Thereafter, the unexposed portion of the negative photoresist 31 is removed to expose the nickel film 26. Then, gold is laminated on the nickel film 26, and the remaining portion of the negative photoresist 31 is peeled therefrom to obtain a gold-plated wiring. Here, the chromium film 25 of the chromium/nickel laminate 27 can be dispensed. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012214858(A) 申请公布日期 2012.11.08
申请号 JP20110081844 申请日期 2011.04.01
申请人 NIKON CORP 发明人 ONO ICHIRO
分类号 C23C28/00;G03F7/20;H05K3/24 主分类号 C23C28/00
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