发明名称 |
Methods For Using Porogens For Low K Porous Organosilica Glass Films |
摘要 |
A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the porogen to provide the porous film with pores and a dielectric constant less than 2.6. |
申请公布号 |
US2012282415(A1) |
申请公布日期 |
2012.11.08 |
申请号 |
US201113286634 |
申请日期 |
2011.11.01 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
VRTIS RAYMOND NICHOLAS;O'NEILL MARK LEONARD;VINCENT JEAN LOUISE;LUKAS AARON SCOTT;HAAS MARY KATHRYN |
分类号 |
C23C16/56;C08K5/5425 |
主分类号 |
C23C16/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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