| 摘要 |
<p>The invention concerns a method for detecting defects on or under a surface of a sample (3), comprising : measuring a signal during a first scan of the surface through a first optical circuit (17, 20), e.g. dark-field scan; detecting, from the signal measured during the first scan, at least one undifferentiated event corresponding to a false defect due to measurement noise or a real defect on or under the scanned surface of the sample; measuring a signal during a second scan of the sample through a second optical circuit (23, 24), i.e. light-field scan; and identifying, among the detected undifferentiated events, and from the signal measured during the second scan, which undifferentiated events correspond to a real defect and which undifferentiated events correspond to a false defect. The invention also relates to a device (2) implementing this method.</p> |
