发明名称 PRODUCTION METHOD FOR LAMINATE HAVING PATTERNED METAL FILMS, AND PLATING LAYER-FORMING COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a production method for a laminate having patterned metal films, capable of readily plasma etching a plating layer and of obtaining a laminate having excellent insulating properties between the patterned metal films. <P>SOLUTION: The production method for the laminate having patterned metal films includes: a plating layer-forming step in which a plating layer is formed on top of a substrate, using a plating layer-forming composition including a polymer having a prescribed unit; a catalyst application step in which a plating catalyst or a precursor thereof is applied to the plating layer; a plating step in which plating is performed and a metal film is formed on top of the plating layer; a pattern-forming step in which an etching fluid is used to form the patterned metal film; an acidic solution contacting step in which the substrate having the patterned metal film and an acidic solution are brought in contact with each other; and a plating layer-removal step in which the plating layer in an area in which no patterned metal film is formed, is removed by plasma etching. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012214895(A) 申请公布日期 2012.11.08
申请号 JP20120077822 申请日期 2012.03.29
申请人 FUJIFILM CORP 发明人 KANO TAKEYOSHI;TAKAMOTO TETSUFUMI;UEKI YUKITAKA
分类号 C23C18/31 主分类号 C23C18/31
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