| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device which allows for execution of precision measurement of an optical system for image formation when the limit of resolution depends on the position and orientation of an image formation structure in an obscuration optical system, and to provide a projection exposure device having this method, its method and a sensor unit. <P>SOLUTION: The device comprises a first lattice pattern (6) having a first lattice structure (16) which can be positioned in the upstream beam path of an optical system for image formation, a second lattice pattern (8) having a second lattice structure (18) which can be positioned in the downstream beam path, and a sensor unit for spatially-resolved measurement of a fringe pattern superimposed which is formed during image formation of the first lattice structure (16) of a first lattice pattern (6) into the second lattice structure (18) of a second lattice pattern (8). <P>COPYRIGHT: (C)2013,JPO&INPIT |
