| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum film deposition apparatus capable of continuously executing vapor deposition of a vapor deposition material on a base material for a long period of time, and depositing a thin film of high quality on the base material. <P>SOLUTION: The vacuum film deposition apparatus includes: a vacuum vessel 10; a base material 11 disposed in the vacuum vessel with a face for film deposition directed downward; a vapor deposition material storage container 18 which is arranged below the base material in the vacuum vessel, and has a vapor deposition material storage container opening part 172 provided at the position substantially opposite to the face for film deposition on its upper side; a plasma gun 3 having an anode electrode 31 and emitting plasma in the vacuum vessel; a heating unit 4 which heats the vapor deposition material storage container and evaporates the vapor deposition material; and an electric potential applying unit 5 for applying the positive electric potential to the vapor deposition material storage container. <P>COPYRIGHT: (C)2013,JPO&INPIT |
