发明名称 |
EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS |
摘要 |
An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location.
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申请公布号 |
US2012280148(A1) |
申请公布日期 |
2012.11.08 |
申请号 |
US201013520982 |
申请日期 |
2010.11.30 |
申请人 |
LOOPSTRA ERIK ROELOF;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BUURMAN ERIK PETRUS;MESTROM WILBERT JAN;ASML NETHERLANDS B.V. |
发明人 |
LOOPSTRA ERIK ROELOF;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;BUURMAN ERIK PETRUS;MESTROM WILBERT JAN |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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