ELECTRON BEAM DRAWING METHOD, ELECTRON BEAM DRAWING SYSTEM, METHOD FOR MANUFACTURING CONCAVO-CONVEX PATTERN CARRIER, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM

摘要

PROBLEM TO BE SOLVED: To carry out an electron beam drawing process for obtaining a resist pattern in accordance with a fine pattern drawn by correcting dimensional changes caused by time delay to PEB (post exposure baking).

SOLUTION: An electron beam drawing method for drawing a fine pattern including a servo pattern and a groove pattern is provided. In the method, when irradiation time of an electron beam EB is controlled by an on-off signal applied to blanking means 26 that blocks the electron beam EB, exposure luminous energy on a resist 11 is controlled by changing a duty ratio in the irradiation of the electron beam EB by an on-off signal for each drawing radius in each pattern based on sensitivity variation data of the resist 11 with respect to the lapse of time after exposure on the pattern.

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