发明名称 Lift-off structure for substrate of a photoelectric device and the method thereof
摘要 The present invention related to a lift-off structure adapted to a substrate having a photoelectric device, the structure comprising: a buffer layer, forming on the substrate; an upper sacrificial layer, forming on the buffer layer; an etch stop layer, forming on the upper sacrificial layer, and the photoelectric device structure forming on the etch stop layer.
申请公布号 EP2521189(A2) 申请公布日期 2012.11.07
申请号 EP20110401617 申请日期 2011.10.18
申请人 INSTITUTE OF NUCLEAR ENERGY RESEARCH ATOMIC ENERGY COUNCIL 发明人 TSAI, YU-LI;WU, CHIH-HUNG;HO, JEI-LI;HUANG, CHAO-HUEI;YANG, MIN-DE
分类号 H01L31/18;H01L21/683;H01L21/78;H01L31/0304;H01L31/0687;H01L31/0693;H01L31/0735 主分类号 H01L31/18
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