发明名称 |
Lift-off structure for substrate of a photoelectric device and the method thereof |
摘要 |
The present invention related to a lift-off structure adapted to a substrate having a photoelectric device, the structure comprising: a buffer layer, forming on the substrate; an upper sacrificial layer, forming on the buffer layer; an etch stop layer, forming on the upper sacrificial layer, and the photoelectric device structure forming on the etch stop layer. |
申请公布号 |
EP2521189(A2) |
申请公布日期 |
2012.11.07 |
申请号 |
EP20110401617 |
申请日期 |
2011.10.18 |
申请人 |
INSTITUTE OF NUCLEAR ENERGY RESEARCH ATOMIC ENERGY COUNCIL |
发明人 |
TSAI, YU-LI;WU, CHIH-HUNG;HO, JEI-LI;HUANG, CHAO-HUEI;YANG, MIN-DE |
分类号 |
H01L31/18;H01L21/683;H01L21/78;H01L31/0304;H01L31/0687;H01L31/0693;H01L31/0735 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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