| 摘要 |
PURPOSE: A method for testing an optical critical dimension is provided to obtain right spectrum data by simultaneously synchronizing a symmetric pattern and an asymmetric pattern mixed in a unit pattern to vary a critical area. CONSTITUTION: A first reference spectrum data is detected by emitting light to a first vertical pattern including an inner pattern. A second vertical pattern is simulated by varying the critical area of the first vertical pattern and the critical area of the inner pattern corresponding to the variation of the critical area of the first vertical pattern. A second reference spectrum data about a second vertical pattern is detected. [Reference numerals] (AA) Start; (BB) Detecting reference spectrum data about a reference pattern; (CC) Extracting a unit pattern in a reference pattern; (DD) Simulating a simulating pattern by simultaneously increasing and decreasing CD of each pattern in a unit pattern; (EE) Detecting spectrum data about a simulating pattern; (FF) Finish
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